MIT researchers say nanoscale 3D transistors made from ultrathin semiconductor materials promise more efficient electronics; quantum mechanics offers a path beyond silicon limits

There are still many challenges yet to be overcome

News By Wayne Williams published 23 November 2024

• MIT creates nanoscale transistors for efficient electronics
• Quantum tunneling delivers low-voltage, high-performance
• The technology has the potential to replace silicon

MIT researchers have developed a nanoscale transistor that could potentially pave the way for electronics more efficient than silicon-based devices.

Traditional silicon transistors, critical in most electronic devices, face a physical constraint known as “Boltzmann tyranny,” which prevents them from operating below a certain voltage.

This limitation restricts energy efficiency, especially as modern applications like AI push for faster and more powerful computation.

Nanowire heterostructures

To address these limitations, the MIT team created a new three-dimensional transistor using ultrathin semiconductor materials, including gallium antimonide and indium arsenide.

The design leverages a quantum mechanical phenomenon known as quantum tunneling, allowing electrons to travel through an energy barrier rather than over it. This structure, consisting of vertical nanowires just a few nanometers wide, allows these transistors to operate at much lower voltages while maintaining performance on par with state-of-the-art silicon transistors.

“This is a technology with the potential to replace silicon, so you could use it with all the functions that silicon currently has, but with much better energy efficiency,” Yanjie Shao, an MIT postdoc and lead author of the study, told MIT News. By relying on tunneling transistors, the device achieves a sharp transition between “off” and “on” states with lower voltage, something silicon transistors cannot do as efficiently.

The transistors are engineered using quantum confinement, where electrons are controlled within a tiny space, enhancing their ability to tunnel through barriers. MIT’s advanced facility, MIT.nano, allowed researchers to craft the precise 3D geometry necessary for this effect, creating vertical nanowire heterostructures with diameters as small as 6 nanometers, the tiniest 3D transistors reported to date.

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